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00672nam a2200193 a 4500 |
| 001 |
314232.2.f |
| 003 |
arsfunl |
| 008 |
200806s 1979USA 000 0 eng d |
| 040 |
# |
# |
|a HIG
|
| 080 |
# |
# |
|a 533.9
|
| 100 |
1 |
# |
|a Benenson, David M.
|e ed.
|
| 110 |
2 |
# |
|a American Chemical of Chemical Engineers
|
| 245 |
1 |
0 |
|a AICHE Symposium Series
|b Plasma chenical processing
|c editado por David M. Benenson, Emil Pfender
|
| 260 |
# |
# |
|a New York :
|b American Chemical of Chemical Engineers ,
|c 1979
|
| 300 |
# |
# |
|a 92 p. :
|b il. ;
|c 28 cm.
|
| 490 |
0 |
# |
|a AICHE Symposium Series
|
| 653 |
1 |
# |
|a Física del plasma
|
| 710 |
2 |
# |
|a American Chemical of Chemical Engineers
|
| 090 |
|
|
|a Hemeroteca Orden 8
|d 75(186)
|i 91071
|u 2
|